Vapor Deposition Furnace

FAQ

Brother Furnace provides perfect solutions for Vapor Deposition Furnace for customers all over the world. The following are answers to common Tube furnace questions.

  • 1.What is a CVD Tube Furnace?

    A CVD (Chemical Vapor Deposition) tube furnace is a equipment used for film deposition, converting gaseous precursors into solid films through chemical reactions. Its structure is typically tubular, with controllable internal temperatures, making it suitable for high-temperature processes.

  • 2.What is the Difference Between CVD and PECVD?

    CVD (Chemical Vapor Deposition) utilizes thermal energy to promote gas-phase reactions for film deposition, while PECVD (Plasma-Enhanced Chemical Vapor Deposition) employs plasma to lower the deposition temperature and improve film quality. PECVD can deposit films at relatively low temperatures, making it suitable for temperature-sensitive substrates.

  • 3.What are the Features of a CVD Tube Furnace?

    This CVD tube furnace reaches 1200°C with HRE resistance wire heating and features intelligent 50-segment control, over-temperature protection, and double-layer air cooling. It supports a film deposition rate of up to 10 A/s, with ±1°C temperature accuracy and 8% uniformity, achieving an ultimate vacuum of 10 Pa for stable processes. Optional gas mixing systems and a high-definition touchscreen enhance functionality.

  • 4.In Which Fields is the CVD Tube Furnace Generally Applied?

    CVD tube furnaces are essential in semiconductor, optoelectronic materials, thin-film solar cells, coating technology, and advanced materials research. They deposit high-quality films to improve equipment performance in the semiconductor industry and manufacture efficient optoelectronic conversion layers. Additionally, their use in nanomaterials and coating technology ensures high uniformity and consistency in film preparation, facilitating the development of various high-performance products.

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  • DURING SALES

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  • AFTER-SALES

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