CVD Tube Furnace

Introduction

Brother Furnace high-temperature CVD furnace, working temperature from 300℃ to 1600℃. With a vacuum pump and gas mixing, our CVD tube furnace adopts an advanced temperature control system, high-temperature accuracy, excellent gas flow accuracy, easy operation, excellent heat-insulation effect, and symmetrical temperature uniformity. Mainly used for labs of universities, research centers, production enterprises, etc.

Features

● High-temperature operation:

CVD tube furnaces can provide a high-temperature environment and are suitable for many high-temperature deposition processes, including the growth of high-melting point materials.

● High Uniformity:

The design of the tube furnace helps achieve uniformity in the deposition process, ensuring a uniform film is formed across the entire substrate surface.

● Multi-material applicability:

CVD tube furnaces are widely suitable for the deposition of a variety of materials, including metals, oxides, nitrides, carbides, etc., making them widely used in semiconductors, optoelectronics, nanotechnology and other fields.

● Precision control:

Tube furnaces are usually equipped with advanced control systems to ensure precise control of parameters such as temperature, atmosphere and flow rate during the deposition process.

● Large-scale production:

Some CVD tube furnaces have high throughput and high production efficiency and are suitable for large-scale industrial production.

● Adjustable deposition rate:

The deposition rate can be controlled by adjusting reaction conditions to meet the requirements of different applications.

Applications

● Semiconductor manufacturing:

Used to grow insulating layers, conductor layers or semiconductor films on silicon wafers, which is a key process step in integrated circuit manufacturing.

● Optical coating:

Coating used to prepare the surface of optical components, such as anti-reflective coatings, mirrors, etc.

● Material modification:

CVD tube furnace can be used to change the properties of the material surface, such as surface coating, alloy deposition, etc.

● Nanotechnology:

Used to control the growth of materials at the nanoscale and prepare nanoparticles, nanowires, etc.

● Graphene growth:

Used to grow graphene films and is a common method for preparing graphene.

● Chemical vapor deposition:

used to deposit various functional films, such as barrier layers, conductive layers, etc.